Transport in thermal DIP pen nanolithography

Brent A. Nelson, Tanya L. Wright, William P. King, Paul E. Sheehan, Lloyd J. Whitman

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The thermal dip pen nanolithography (tDPN), which uses atomic force microscope (AFM) cantilevers with integrated heaters, is described. In tDPN, a molecular ink with a melting temperature above ambient was selected and then coated onto the AFM tips. It was observed that at ambient temperature and at 57°C, there was no deposition, showing that the tip does not contaminate the surface at low temperatures. It was also observed that as the tip temperature reached 98°C, some deposition occurred, while at a tip temperature of 122°C, the octadecylphosphonic acid (OPA) became more mobile and a more robust deposition occurred.

Original languageEnglish (US)
Title of host publicationProceedings of the 3rd ASME Integrated Nanosystems Conference - Design, Synthesis, and Applications
Pages125-126
Number of pages2
StatePublished - Dec 1 2004
Event3rd ASME Integrated Nanosystems Conference - Design, Synthesis, and Applications - Pasadena, CA, United States
Duration: Sep 22 2004Sep 24 2004

Publication series

NameProceedings of the 3rd ASME Integrated Nanosystems Conference - Design, Synthesis, and Applications

Other

Other3rd ASME Integrated Nanosystems Conference - Design, Synthesis, and Applications
CountryUnited States
CityPasadena, CA
Period9/22/049/24/04

    Fingerprint

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Nelson, B. A., Wright, T. L., King, W. P., Sheehan, P. E., & Whitman, L. J. (2004). Transport in thermal DIP pen nanolithography. In Proceedings of the 3rd ASME Integrated Nanosystems Conference - Design, Synthesis, and Applications (pp. 125-126). [NANO2004-46074] (Proceedings of the 3rd ASME Integrated Nanosystems Conference - Design, Synthesis, and Applications).