Initial results on the development of A new wafer inspection paradigm

Tarek A. El Doker, Josh King, David R. Scott

Research output: Contribution to conferencePaper

Abstract

A new paradigm for wafer inspection is being developed that would resolve many pending issues of -wafer inspection today. This paradigm integrates 1) a DRAM fabrication line simulation model, producing synthetic images of "Epical" wafer maps and associated defects to, 2) fuzzy clustering/declustering algorithms that identify various defects, and 3) a unique defect tracking mechanism to monitor patterns of defects across wafer maps. This approach holds promise for in-line process control by allowing for off-site analysis of fabrication line problems and unsupervised adaptation and optimization of application-specific inspection algorithms. The paper reports on the progress made towards the fulfilment of this paradigm.

Original languageEnglish (US)
Pages124-127
Number of pages4
StatePublished - Jun 22 2004
Event2004 IEEE Southwest Symposium on Image Analysis and Interpretation - Lake Tahoe, NV, United States
Duration: Mar 28 2004Mar 30 2004

Other

Other2004 IEEE Southwest Symposium on Image Analysis and Interpretation
CountryUnited States
CityLake Tahoe, NV
Period3/28/043/30/04

ASJC Scopus subject areas

  • Software
  • Computer Vision and Pattern Recognition
  • Computer Science Applications

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  • Cite this

    El Doker, T. A., King, J., & Scott, D. R. (2004). Initial results on the development of A new wafer inspection paradigm. 124-127. Paper presented at 2004 IEEE Southwest Symposium on Image Analysis and Interpretation, Lake Tahoe, NV, United States.